ADVANCED TECHNOLOGIES FOR MASS PRODUCTION OF SEMICONDUCTOR ELECTRONICS
RSS feed
RPE "ESTO" (a member company of the Zelenograd ITC) has developed a 200 mm scaled PCB module (oxide, nitride, polymers, low-k, p-Si, TSV, etc.) with an overlap of the range of all process parameters that is unattainable for any other industrial system on the market.
The original plasma source is the world's only flat narrow-gap (30-40 mm) process inductively coupled plasma (ICP) generator, known as the "Groovy ICP".
For reference: a conventional inductive discharge (ICP = Inductively Coupled Plasma), implemented in a large volume, is characterized by a wide range of pressure and power. And the narrowness of the gas-discharge gap, that is, the minimum volume typical for capacitive planar reactors (CCP = Capacitively Coupled Plasma), guarantees the best kinetic control of the gas composition due to the short residence time of the gas in the plasma.
A unique combination of the properties of "Groovy ICP" is its ability to independently and simultaneously set both the physical and chemical conditions of the process in the radial direction. This is the only industrial source in the world that allows simultaneous local control of the plasma density and its chemical composition along the radius of the plate.
For more information, follow the link: http://www.nppesto.ru/about/news/41/
The original plasma source is the world's only flat narrow-gap (30-40 mm) process inductively coupled plasma (ICP) generator, known as the "Groovy ICP".
For reference: a conventional inductive discharge (ICP = Inductively Coupled Plasma), implemented in a large volume, is characterized by a wide range of pressure and power. And the narrowness of the gas-discharge gap, that is, the minimum volume typical for capacitive planar reactors (CCP = Capacitively Coupled Plasma), guarantees the best kinetic control of the gas composition due to the short residence time of the gas in the plasma.
A unique combination of the properties of "Groovy ICP" is its ability to independently and simultaneously set both the physical and chemical conditions of the process in the radial direction. This is the only industrial source in the world that allows simultaneous local control of the plasma density and its chemical composition along the radius of the plate.
For more information, follow the link: http://www.nppesto.ru/about/news/41/
X