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Analysis circuits

Analysis circuits Company: Center "Diagnosis and modification of microstructures and nanostructures" MIET
Contact name: Kukin Vladimir
Email: kukin@miee.ru
Phone: +7 (499) 720-87-65
Website: www.miee.ru

Key limit /boundary/ process parameters:

  • The electron beam:
- accelerating voltage - 50 ÷ 30 kV;
- resolution - 0.8 nm - 15 kV, 0.9 nm - 1 kV;
- beam current <= 26 nA.
  • The ion beam:
- accelerating voltage - 500 V ÷ 30 kV;
- resolution - 4.5 nm - 30 kV;
- beam current - 1.5 pA ÷ 65 nA.
  • Working chamber:
- the maximum size of the loaded plate - 150 mm;
- maximum sample weight - 500 g

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